Our state-of-the-art Quanta-Clean ultrasonic generator is 30% smaller, and operates 10% cooler and 10% more efficient (with >85% power conversion) than other ultrasonic products on the market.
- Power factor correction
- Limited 2 Year Warranty
- Customizable tank configurations
| Sweep Bandwidth | 4-6 kHz |
| Sweep Modulation (optional) | 300-1000 Hz |
| Input Power | 90-240 VAC |
| Generator Wattage Options | 250, 500, or 1000 watt |
| Frequency (choice of 1) | 40 kHz, 68 kHz, or 170 kHz |
| Tank Material of Construction | 316L Stainless Steel Tank Options |
| Tank Configurations (WxLxH Dimensions) | 8” x 8” x 10” Single 6” Wafer Carrier 8” x 16” x 10” Dual 6” Wafer Carrier 11” x 12.5” x 13” Single 8” Wafer Carrier Custom Sizes Also Available |
When to use Ultrasonic Cleaning vs. Megasonic Cleaning Systems
Megasonic and Ultrasonic Cleaning are both helpful for particle removal applications, and enhancing the speed and effect of most diffusion limited chemical reactions. Both have also demonstrated enhanced chemical residual removal for rinse applications. So how do you know when to use Ultrasonics or Megasonics? Here are a few good rules to determine which frequency is right for your application.
| Ultrasonic Cleaning Applications | Megasonic Applications |
| Large particle removal typically >5µm | Small Particle removal typically 30nm – 5µm |
| Robust Substrates | Sensitive Substrates or Structures |
| Heavy films or gross contamination | Heat Sensitive Substrates |
| Photoresist Removal – Metal Lift Off | Post Photoresist Removal Clean |
| Multi-Surface Cleaning | Line of Sight Cleaning |
Ultrasonic Applications & Environments Applications & Environments
- Flat Panel
- Medical Devices
- Hard Disk Drives
- LED / Laser
- Optics
- Semiconductor
- MEMs
- Solar Wafers & Cells
- Research Labs
- Universities
- OEM Systems